COSINC News

COSINC Snapshot: Who We Serve and How We Grow

Elsi Taitano — Wed, 17 Sep 2025 17:45:18 +0000

COSINC Snapshot: Who We Serve and How We Grow Elsi Taitano Wed, 09/17/2025 - 11:45 Aju Jugessur

COSINC by the Numbers

FY25 users’ affiliations, demonstrating the COSINC users base, predominantly from CU Boulder/system, followed by industry and external non-profit user.

A data-driven approach is essential to guiding COSINC’s operations and demonstrating its impact—both of which are key to long-term sustainability and continued institutional support. As a result, COSINC actively tracks several operational metrics, including:

Total number of users
Diversity of user backgrounds
Number of principal investigators (PIs) supported
Training sessions conducted

In addition to these internal metrics, COSINC also monitors the external research funding enabled through its facilities and services over the course of each year.

These metrics help quantify COSINC’s value to the research community and inform strategic planning for future growth and resource allocation.

A selection of key COSINC metrics that provide snapshots of the users ad PIs served in FY25, cumulative users/PIs FY23-25, including the training sessions provided.

Outreach & Training Highlights

COSINC continues to offer a wide range of workshops and outreach activities to engage the research community and support technical development. From June to October 2024, the following workshops were conducted:

Electron Beam Lithography (EBL)
X-ray Diffraction (XRD)
Small Angle X-ray Scattering (SAXS)

In June, COSINC also launched its first EBL User Meeting, aimed at introducing the new EBL capability scheduled for full deployment by September 2025. The meeting provided a platform to gather user input on technical requirements for nanoscale patterning.

Planning is currently underway for the inaugural COSINC Networking Event, scheduled for November 2025. More details will be shared in the coming weeks.

In addition, a Beamer workshop—focused on proximity effect correction for nanoscale patterning—is tentatively scheduled for November 2025. Beamer is a powerful software tool used in conjunction with EBL systems to optimize pattern fidelity.

Looking ahead, COSINC is actively developing new training programs, courses, and workshops. One exciting initiative is the planning of an undergraduate/graduate course that will include hands-on experience in the future NQN cleanroom. This course will also leverage existing COSINC capabilities for lab sections, providing students with practical exposure to advanced nanofabrication tools and techniques.

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New State-of-the-Art Capabilities

Elsi Taitano — Wed, 17 Sep 2025 16:54:05 +0000

New State-of-the-Art Capabilities Elsi Taitano Wed, 09/17/2025 - 10:54 Aju Jugessur

Electron Beam Lithography

EBL system showing inside the temperature-controlled cabin.

As shared in the previous newsletter, a new Electron Beam Lithography (EBL) system—EBPG 5150plus—was acquired through an NSF Major Research Instrumentation (MRI) award, thanks to the efforts of principal investigators J. Gopinath, S. Diddams, A. Jugessur, S. Sun, and W. Park.

We are pleased to announce that the EBL system has now been installed, commissioned, and successfully passed its acceptance tests. The tool is operational (see Figure 2), and our staff is currently gaining experience by running exposure jobs and developing standard operating procedures. This includes designing a training plan to onboard future users.

As mentioned previously, one of the cleanroom bays within the COSINC facility required renovations to accommodate the EBL system. Specifically, ceiling height adjustments were made, several utilities were rerouted, and multiple HEPA filters were removed to mitigate acoustic noise and vibrations that could interfere with the electron beam during pattern exposures.

The tool will be available to users by the end of September, with a select group of advanced users receiving early access. The system is integrated with Beamer (GenISys), a powerful software tool that manages electron scattering effects and optimizes pattern data. A separate training session on this software will be offered to users before the end of the calendar year.

Supporting the NQN Mission

As part of the support for the National Quantum Nanofab Facility (NQN) mission and plans, the COSINC cleanroom will accommodate several tools acquired through NQN funding. These tools will be housed within the existing cleanroom due to its established infrastructure and processing capabilities. For example, lithography work will be conducted in the COSINC cleanroom’s yellow room. This approach has helped reduce costs by streamlining and sharing resources where nanofabrication needs overlap between the current COSINC user base and the future NQN user community.

Raith Picomaster XF Laser Writer

Raith Laser Writer Picomaster XF high-throughput lithography.

Given COSINC’s longstanding professional relationship with Raith and familiarity with the unique features of their systems, a new laser writer—Raith Picomaster XF—has been acquired. The Picomaster XF is a standalone, high-throughput UV laser direct writer equipped with ultra-high-precision components. It utilizes multibeam exposure technology to achieve high exposure speeds. The optical module features a high-power 405 nm laser diode and a grating light valve (GLV), enabling exposure of a 200-micron stripe in a single scan.

A unique feature of the Picomaster XF is its connectivity with the recently installed EBPG 5150plus system, allowing for shared alignment marks and superior overlay alignment accuracy. This capability is critical when patterning substrates that are transferred between the two systems, significantly improving process efficiency and reducing patterning errors. Additionally, the Picomaster XF’s direct-write approach eliminates field-to-field stitching, further minimizing patterning errors.

Key performance specifications include:

Maximum writing speed at best resolution: 280 mm²/min
Exposure time for a 6-inch wafer at 0.6 µm resolution: ~60 minutes
Capabilities: High throughput, grayscale lithography, and fine resolution

This instrument also plays a critical role in fabricating optical masks for use with the new OAI 806EIR mask aligner. Moreover, it supports direct-write lithography of complex shapes and structures on a wide range of substrates—an essential step in quantum device fabrication. Applications include exposing optical waveguides for light coupling into submicron structures and fabricating electrodes for quantum devices based on superconducting platforms.

Additional tabletop systems acquired through NQN funding include:

Contact profilometer: KLA Tencor Model P-7
Optical profilometer: Sensofar S neox 3D with piezo stage
Optical microscope: Keyence VHX-X1

These tools have been installed and are already available for use.

Coming Soon: Ultra-High Resolution FIB-SEM

Another exciting addition is a state-of-the-art ultra-high-resolution Focused Ion Beam-Scanning Electron Microscope (FIB-SEM)—Scios 2 HiVac. While the older Nova 600i FIB-SEM remains operational and will continue to be used, the Scios 2 offers significant advancements. It features both an electron beam and a Ga⁺ focused ion beam, making it essential for quantum device fabrication and materials science research.

New ThermoFisher FIB-SEM Scios 1, to be installed in COSINC in late spring 2026.

Key capabilities of the Scios 2 include:

Simultaneous secondary and backscattered electron imaging at low landing energies
Ga⁺ FIB resolution from 500 eV to 30 keV
Beam current up to 65 nA with ≥40 A/cm² current density
In-situ sample preparation and 3D characterization (e.g., FIB tomography)
Integrated EasyLift manipulator for in-situ lift-out (INLO) of lamellae for S/TEM
16-bit patterning and imaging engine (PIA), 110 mm × 110 mm stage, optical navigation camera, plasma cleaner, and unified user interface

The Scios 2 has been purchased, and preparations are underway to retrofit an existing COSINC suite to accommodate the instrument. Delivery and operational readiness are expected by late spring 2026.

Several other tools—including ICP etchers, thin-film deposition systems, metrology instruments, and packaging tools—have also been procured. These will be delivered and installed once the NQN facility is complete. Detailed information about each tool will be available on a dedicated NQN website, currently under development and expected to launch in the coming months.

These new capabilities will not only support the NQN mission but also benefit the current COSINC user community.

New Hitachi FESEM Installed

The cold field emission FESEM SU8600, with magnification of up to 200kx.

We are excited to announce the installation of a new ultra-resolution field emission scanning electron microscope (FESEM)—the Hitachi SU8600. This advanced instrument features a cold field emission gun, magnification capabilities up to 250,000×, two secondary electron detectors, and a backscattered electron (BSE) detector (see Figure 5). The SU8600 replaces the previous JEOL FESEM, which was damaged during a power outage in Spring 2024.

Following a lengthy insurance claim process, negotiations, and review, the new instrument was acquired, installed, and has been operational since June 2024.

In addition, through an internal CU Boulder Cores funding competition—RIO Core Facility Assistance Grants—we successfully secured funding to purchase an Oxford Energy Dispersive X-ray Spectroscopy (EDS) system (Model: Aztec Live Std with Ultim Infinity 40). This system will be integrated with the FESEM in Fall 2024.

EDS is a widely used chemical microanalysis technique that complements scanning electron microscopy. It detects X-rays emitted from a sample during electron beam bombardment, allowing for characterization of the elemental composition within the interaction volume. EDS can analyze a broad range of materials, including metals, ceramics, and minerals.

By adding the EDS system to the SU8600 FESEM, the instrument gains an additional dimension of analytical capability—enabling both high-resolution imaging and elemental/compositional analysis. This enhancement will significantly benefit research in materials science and quantum device fabrication.

Quantinuum (Honeywell) Donation: Oxford PlasmaPro 100 Cobra with ALE Capability

CU Boulder and COSINC are pleased to announce the generous donation of an inductively coupled plasma (ICP) etcher—Oxford PlasmaPro 100 Cobra, equipped with Atomic Layer Etching (ALE) capability (see Figure 6). The donation, which also includes two gas cabinets, was made by Quantinuum, a company headquartered in Broomfield, Colorado, with operations in Minnesota.

This etcher will serve both current COSINC users and the future NQN user community. It is specifically dedicated to processing III-V materials, utilizing both chlorine and fluorine chemistries. ICP reactive ion etching (RIE) is an advanced technique that offers high etch rates, excellent selectivity, and low-damage processing. It also provides superior profile control due to the ability to maintain plasma at low pressures.

The donated Oxford ICP etcher Plasma Pro100 Cobra.

The Cobra model features a high-density, uniform plasma source capable of operating at low pressures. A key advantage of this system is the independent control of substrate DC bias via a separate RF generator, which allows precise control of ion energy. This flexibility enables tailored etching results to meet specific process requirements.

This donation significantly enhances COSINC’s fabrication capabilities and supports the broader mission of the NQN by enabling advanced etching processes critical for quantum device development.

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COSINC Secures $20M NSF Midscale R1 Award to Establish National Quantum Nanofab Facility at CU Boulder

Elsi Taitano — Wed, 17 Sep 2025 16:31:37 +0000

COSINC Secures $20M NSF Midscale R1 Award to Establish National Quantum Nanofab Facility at CU Boulder Elsi Taitano Wed, 09/17/2025 - 10:31 Aju Jugessur

COSINC has been instrumental in securing NSF Midscale R1 funding through a recent $20 million award to establish the National Quantum Nanofab Facility (NQN) at the ��Ƶ. The principal investigators (PIs) on this award are S. Diddams (Electrical, Computer & Energy Engineering), A. Jugessur (College of Engineering and Applied Science), J. Gopinath (Electrical, Computer & Energy Engineering), and C. Regal (Physics), along with several senior personnel from other CU Boulder units.

This achievement reflects several key strengths: decades of exceptional research at CU Boulder in quantum science and engineering, a highly capable team of PIs, strong support from the College of Engineering and Applied Science and campus leadership, and the foundational infrastructure and staff support provided by COSINC.

The NQN will serve as the cornerstone of a quantum nanofabrication ecosystem that leverages CU Boulder’s unique expertise in atomic, molecular, and optical (AMO) physics. It aims to address the national need for quantum devices that integrate neutral atoms, ions, and photonics for applications such as quantum computing, quantum networking, atomic clocks, and advanced sensors for electric, magnetic, and gravitational fields.

Currently, the United States lacks a facility that collocates the necessary tools and fabrication processes for such devices. The NQN will fill this gap by combining cutting-edge equipment with Boulder’s scientific and technical expertise. With an open-access model for academic, industrial, and government partners, the NQN will accelerate the development of quantum hardware, driving transformative scientific, technological, and economic growth.

The new NQN facility will be annexed and connected to the existing COSINC cleanroom (~3,500 sq. ft), where key processes such as optical and electron beam lithography will continue. These will support additional processes in the new NQN cleanroom, which is currently designed to be approximately 3,600 sq. ft (see Figure 1 for artistic rendering and layout). Together, these spaces will form a contiguous ISO 5/6 cleanroom environment to enable nanofabrication of a wide range of quantum nanoscale devices.

Operations and administration of the NQN facility will be integrated with COSINC, with additional staff hired to manage technical, financial, and administrative functions specific to NQN activities. The facility is expected to be completed by mid-2027.

Layouts of the existing COSINC cleanroom and the new addition.

Artistic rendering of the NQN facility, annexed to the COSINC cleanroom, SEEL Building

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